We are a young dynamic group of the Low Temperature Plasma laboratory of the National Institute for Lasers, Plasma and Radiation Physics focused on fundamental and applicative research of plasma processes. We are specialized on functional coatings deposition, characterization and development using two plasma based methods:

  • Thermionic Vacuum Arc (TVA) – a plasma source developed in our laboratory that can run in two modes: high vacuum or controlled atmosphere of different gasses
  • Magnetron Sputtering (MS) in different modes: RF, DC, High Power Impulse in normal or reactive conditions

 We are also focused on designing and developing new plasma sources and solutions for materials functionalization and coatings for extreme environments.  

Head of Elementary Processes in Plasma and Applications Group : Corneliu Porosnicu